Products Description
With advanced Linear Sputtering PVD systems, you can process semiconductor or metal thin films on large area panels for display, photovoltaic and semiconductor applications. We design these systems to address the challenges researchers face when sputtering on large areas or large numbers of substrates.
From gas flow and plasma management to magnetron uniformity and temperature control, Linear Sputtering PVD systems allow you to revolutionize your workflow and achieve higher throughput than before.
Create devices on very large substrates, stacking multiple layers in a single run with high uniformity. Even with larger targets than usual, materials are used very efficiently.